A surface treating appliance, such as a vacuum cleaner, includes a handle, a surface treating head and a support assembly. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. An oxygen-ion implantation process and an annealing process are applied to a method of manufacturing the semiconductor device. Matching of feature-sparse content may be improved by adding blurred versions to the collection.