A photoresist and post etch cleaning solution for semiconductor wafers comprising:A. The apparatus includes a rotatable member adapted to be rotatably driven by the internal combustion engine and a housing affixed to the rotatable member. A flange provided with a external seal cooperates with an end of the outer pipe. The activating element itself is configured in the form of a passive luminous body consisting of an at least translucent material, which can be illuminated by active luminous means. The nucleus includes superior and inferior articular surfaces which may comprise flattened portions such that when the articular surfaces of the nucleus and the end plates are placed in cooperation in a preferred orientation, the flattened andor planar portions are aligned. For instance, the digital work provider may obtain the prestored content from one or more authoritative network resources.