1459911350-c59c68ae-a068-4057-a897-5893eb4ef7a6

An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The source and drain regions of memory cells along a common word line or other common control gate line being programmed by a voltage applied to the common line are caused to electrically float while the source and drain regions of memory cells not being programmed have voltages applied thereto. The computer system may also execute a plurality of instances of the scenario. When the structure is used in a patient having neuropathic pain, the member has an effect on the disappearance of the pain.