A polyamide resin composition, with a sufficiently high weather resistance even when the polyamide resin contains a pigment containing a metal component such as titanium oxide, or a residual catalyst containing a metal component, is provided by a polyamide resin composition comprising from 0. The simulation of the acquired mask data 204 is returned to the mask inspection results 205 and thereafter sent to a wafer transfer simulator 400 along with a reference image at the corresponding portion. Each node in the plurality of nodes corresponds to a component in the plurality of components.