A method for controlling temperature of a semiconductor wafer in a process chamber includes heating the chamber from a starting temperature to a stabilizing temperature at a heating rate of approximately 12 degrees Celsius per second and maintaining the chamber at the stabilizing temperature for a selected stabilization period. A multi-pass approach is taken to place and shape core objects into the available core area formed by the inner surface of the IO ring. In response to receiving the query, the database system determines whether the foreign data currently resides in a cache of the database system. Further, the polymer composition is very thermally conductive, which assists in dissipating heat that is generated by the friction created during normal operation of the device. The permanent-magnet cluster may be configured to create a magnetic pole of the rotor. In a xerographic environment, the image processing system includes a xerographic printer.