1459938025-11af4b15-4125-4a76-a7ae-c28dcb85d3f7

A cable enclosure for use with a cable having a lengthwise cable axis, an outer jacket and a transmission media within the outer jacket, includes a housing assembly and a strain relief structure on the housing assembly. An exposed surface of the semiconductor substrate is irradiated with a plasma, so that many crystalline defects are produced. The container includes a cradle portion proximate the back wall extending into an interior portion of the container. This time period is further reduced in a mirrored storage system or in a system having a spare drive, where a logging file is created to store the data diverted from the primary disk drive during the upgrade process. Individual sets of RF, DC and secular frequency voltage supplies provide potentials to the rods of each multipole ion guide allowing the operation of ion transmission, ion trapping, mass to charge selection and ion fragmentation functions independently in each ion guide.