The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield. The card includes a microcontroller, a storage device connected to the microcontroller; and, connected to the microcontroller, means for tapping into a communication bus of the data processing system where the bus communicates information between a processor of the data processing system and a display panel. A driver circuit provides current to the LED. Further, an inductive device is provided, connected between the first node and the third node. The fabrication involves the deposition of two different oxide layers which have mutually high etch selectivities.