The present invention is to provide a photomask which has a sufficient durability to short-wavelength exposure beams, too, and also can prevent any foreign matter from adhering to patterns for transfer. The valve body through-hole is encircled with secondary bores to accommodate components of the valve stem assembly. The first block of code accesses a first set of memory addresses that are potentially misaligned. Plasma is produced from cathode material, which allows for any electrically conductive material to be used.