Provided is a method of nano-patterning block copolymers and a method of manufacturing a polarizer using the same. There is then formed within the laterally asymmetric trench a capacitor node layer which contacts the exposed upper sidewall portion of the active region of the semiconductor substrate and extends above the active region of the semiconductor substrate. The lead is in contact with the interconnect on a surface of the first depression. using an inductively coupled plasma source. The cover is configured to selectively provide an open phase and a closed phase with respect to the casing, and configured to expose the supply inlet at the open phase.