A carton and a carton blank each includes a first wall, a second wall hingedly connected to the first wall, a handle strap attached at an end thereof to an inwardly displaceable portion of the second wall. The chemical mechanical polishing process has a first removal rate with respect to the planarization layer and a second removal rate with respect to the auxiliary layer and the first removal rate is greater than the second removal rate. A second oxide layer is formed outwardly of the nitride layer. For example, each program may include as parameters a voltage or current pulse amplitude, a pulse width, a pulse rate, and a duty cycle.