In a surface light source device frame, an amount of light that leaks from an outer peripheral surface of the frame can be decreased while a decrease in luminance is suppressed in an emission surface. The silsesquioxane-based compositions are useful as positive resist compositions in forming patterned features on substrate, particularly useful for multi-layer layer 193 nm & 157 nm photolithographic applications. Thus, the contact pressure can be accurately and easily recognized and the contact pressure can be set to be uniform. The system incorporates first and second stage heat exchangers.