A chamber for a freeze-drying device with storage surfaces, whose temperature can be regulated, for containers containing the product that is to be freeze-dried. The method involves the formation of a bis-silane-based nitride liner layer within the isolation trench, which exhibits a five-fold greater resistance to nitride etching solutions as compared with DCS nitride, thereby allowing protection against damage from unintended over-etching. The method further includes resolving links for totality of internal elements and, afterwards, in marking the structure as loaded. Thus, a large operation margin can be ensured even when each circuit is formed by using TFTs having large element characteristic variations and a rough process rule. Therefore, a projection TV that is very high in reliability can be realized.