An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. By specifying block transfer size for a memory portion independently from other memory portions, the performance of the computer system may be enhanced. The device also has an epitaxial layer overlying the surface region and a p-n junction formed within a portion of the epitaxial layer. By using the substrate volume, an increase in the total electrode area per volume is accomplished. The active elements in the other connection configuration have the identical or similar structure to the active element in the first connection configuration, and are connected to power lines of an internal circuit associated therewith but not connected to signal wires and so on in the internal circuit.