An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. A plasmon shield is formed along the ABS and opposite the vertex to confine an electric field from the edge plasmon mode within a small radius of the edge plasmon tip thereby reducing the optical spot size on the magnetic medium and enhancing writability. The rake also includes supporting and regulating members for raising the cross bar from the ground and therefore the group of ray rakes, and actuator elements, independent from each other, through which the operator guides the movements of the supporting elements and those of the supporting and regulating members for raising the cross bar from the ground. A moving control unit, integral with a gripping component, is connected to the sad elastic devices to release coupling devices from each other. The hindrance is disposed between a first one of the nodes and a second one of the nodes. In another embodiment, the number of pins being placed is considered rather than the cumulative amount of noise.