A new control wafer configuration and method allows for the earlier detection of processing problems and resulting striations, localized high concentrations of phosphorous, in product wafers as compared to the standard control wafer configuration currently being used. System utilization of the memory module is monitored by tracking system usage, manifested by read and write commands issued to the memory module, or by measuring temperature changes indicating a level of device activity beyond normal refresh activity. A corresponding method for transferring full frame motion pictures to a photosensitive material is also presented. The electromagnetic wave beam generator may, be configured to provide a wave beam having a polarization substantially similar to its initial polarization.