A method of washing utensils in provided which provides a washing action of a pot and pan washing machine within an isolated portion of the washing machine. The connector provides a substantially visible fluid flow path extending through a substantial portion of the connector. In order to solve this problem, the present invention proposes a method and a semiconductor device wherein the portion of the semiconductor alloy layer lying on the source and drain regions of the transistor is removed before formation of the metal silicide layer is performed. The first network node obtains a buffer measure that is indicative of a buffering degree at the target node for a first group of the second data flows. The number of the particles remaining on the wafer is significantly reduced compared with a conventional method to improve the removing rate of the particles deposited onto the wafer. Positioning LDs 41a and 41b are arranged on a printed board 1.