Disclosed are methods, systems and devices, including a method that includes the acts of etching an inter-row trench in a substrate, substantially or entirely filling the inter-row trench with a dielectric material, and forming a fin and a insulating projection at least in part by etching a gate trench in the substrate. The insulating units include a first surface, a structural seal disposed on at least portions of the first surface, and a second surface disposed on the structural seal. Optimized combinations for each individual store are provided based on the store specific information.