On a multilayer film formed on a lower electrode layer, a resist layer having cutaway parts at a lower portion is formed, and on parts of the upper surface of the multilayer film which are not overlapped with the resist layer except for areas inside the cutaway parts, first gap layers are formed. The method includes mirroring a first logical unit in the primary facility on a second logical unit in the secondary facility, and receiving a command to perform a data storage management activity on the first logical unit. Simulation is used to determine the pattern that will be produced on the surface.