The present invention provides a surface-modified resist pattern which contains a resist pattern having low etch resistance by itself but having a modified and etch-resistant surface and is suitable for fine and high-definition patterning, and a method for efficiently forming the same. The introduction of luminance pixels greatly improves the accuracy of the image acquisition process for a given pixel and image sensor size. The present invention also relates to methods for making the disclosed compounds. Still other embodiments include logic configured to utilize at least one tag to compare the translated updated version of the computer program with the first version of the computer program. The programmable command generator selectively couples commands in a path between a front end of the IO hub and an IO hub logic address and command routing output. The outlet passage is provided with a first pressure reducing valve of piston type, a second pressure reducing valve of diaphragm type and a first check valve for retaining residual pressure, in series in the mentioned order.