An image processing device 102 includes a background-object reference image estimation unit 1, a background-object optical flow calculation unit 2, moving-object reference image estimation units 4 and 9, moving-object heat-haze fluctuation calculation units 5, 6, 7, 10 and 11, and a motion correction unit 3. The spectral values are subsequently grouped together to form groups of spectral values. The one or more tracks are written to a selected stride of the plurality of strides, based on comparing the number of operations required to destage selected tracks from the selected stride to the number of operations required to defragment the compressed data in the selected stride. The basis functions are such that the output of the synthesizer corresponds to a pulse sample for a sample time interval shorter than the integration interval. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.