In a sewing apparatus management system of the invention, a management computer is connected to each terminal provided to a plurality of embroidery sewing machines via a network line. The substrate processing unit 10 includes a substrate holding mechanism 10 for holding the substrate 11 in a specified holding position, and a processing mechanism 32 for applying a specified process to the substrate held with the substrate holding mechanism in which a substrate guide mechanism 20 is provided with a guide pin 15 for guiding the substrate to vicinity of a holding position. Since the antenna apparatus has a bilateral symmetric structure, it excels in weight balance and offers stable performance from the viewpoint of mechanism.