An exposure system includes a liquid supply section for supplying an immersion liquid onto a resist film formed on a substrate; and an exposure section for irradiating the resist film with exposing light through a mask with the immersion liquid provided on the resist film. A handle has a lower end, a central extent, and an upper end. The flange portion is joined to the rear plate for hermetically sealing the penetration hole. The flow restriction is disposed in the flow path between the first and second pressure ports that creates a pressure differential therebetween.