A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. a mixture comprising: at least one alkoxyamine Zn, in which Z denotes a polyvalent group and n an integer greater than 2, preferably of between 2 and 10, advantageously between 2 and 8, andthe monomer intended to form a central block Bis heated to a temperature sufficient to activate the alkoxyamine and polymerize the monomer;2. The protruding portion of the carrier system is spaced apart from the cover sheet by the lower portion of the carrier system to define a cavity between the cover sheet and the carrier system. The algorithm is loaded from a configuration file for execution during a synchronization component runtime using first and second conflicting objects provided by the synchronization component.