1459830481-f258156f-1b6f-4faf-91f2-d6e0a56de941

A processing apparatus including a process chamber, a plasma source disposed within the process chamber, wherein the plasma source is movable in a first direction and is configured to emit an ion beam along a second direction that is orthogonal to the first direction. The server receives a connection to the user via a client data terminal, receives an identifier associated with a second server of the multiple servers, and authenticates the user based on the identifier. Each link includes a planar upper surface for supporting the mattress and a reinforcing rib on the lower surface for added strength. The invention thus offers more economical operability at much higher temperatures when compared with conventional infrared-photosensitive materials, and is especially suitable for detecting midwavelength infrared radiation. Communication may be carried out using the inductive charging link, a separate inductive pathway, or other pathway such as RF or via light waves.