1459831799-0a6b0ef1-eae6-4ce8-b858-a50b401656fc

A mechanism is provided for converting a set of single-layer design rules into a set of split-layer design rules for double patterning lithography. A retainer is transversely mountable through the connector housing into engagement with the endform. In a more particular embodiment, the device can be used in conjunction with a stand operable to receive the conduit such that the conduit can be removed from the stand by the device. The phase shifter is arranged for shifting the phase for feedback signal by controlled amount. A cutting member disposed adjacent the second end of the track member is in communication with the controller and is adapted to cut the weighted tape in response to the signal from the sensor.