To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. The device comprises a storage unit coupled to a transmitter. The circuit breaker further includes an actuator able to trip the circuit breaker and an electronic circuit monitoring the electric signal. The actuator units have a configuration of four piezoelectric sheets laminated to one another.