A manufacturing method of a semiconductor device including a pattern forming method, a reticle correcting method, and a reticle pattern data correcting method are disclosed. A diffuser is provided in an intermediate cavity between the upstream and downstream turbines to recover kinetic energy, as well as minimize or eliminate windage and spinning losses resultant from exposure of the coupling to the flowpath along the turbines. The auxiliary capacitive electrodes have holes formed therethrough. During the programming or reading of the left side, as an example, the right side can be biased to produce channel boosting to reduce data disturbs.