An extreme ultraviolet lithography mask blank may include a multilayer capping structure on the ML reflective coatings on the substrate. It includes an axially rigid support which has at least one retention opening. In one arrangement there is device which consists of a connector that is at least in part formed from a shape memory alloy, which typically undergoes large dimensional changes when heated or cooled through a particular transition temperature range. The first moving mechanism moves the position of the applicator relative to the surface along the surface. A search and query tool also can be coupled to the help system through a search and query interface.