A method of manufacturing the semiconductor device is provided, which provides a prevention for a \u201cdug\u201d of a silicon substrate caused by the etching in regions except a region for forming a film during a removal of the film with a chemical solution. The display controlling section displays an image edited by the editing section on a display screen. The signature can be digitized to create a representation that a device may use in a displayed document. When used with a display element, an input-output unit capable of both location sensing and force sensing operations is provided. The system includes at least one return-flow line coupled to the solidfluid separation device and the reaction vessel to empty the processing fluid from the solidfluid separation device into the reaction vessel. The method includes a step of mounting a hollow cylindrical electric wire assembly, which includes a plurality of straight stacked portions of shaped electric wires, to a hollow cylindrical stator core that includes a plurality of slots formed in the radially inner surface thereof.