A method for testing cleaning effect of a compound or compositions is disclosed. Fitting means is present between the slidable jaw and main body to keep the jaw to the desired tightening position. A thickness of the semiconductor pattern can be controlled by a space between the mask and the base substrate, and a crystal structure of the semiconductor pattern can be controlled by an amount of the gas to be exhausted through the second through hole. Thus, insertion resistance does not become excessive. R41 represents \u2014CO\u2014, or the like. The invention provides among others screenings and detection methods with which regulatory sequences can be identified.