A microlithographic projection exposure apparatus includes a projection light source, a heating light source, a catoptric projection lens and a reflecting switching element, which can be arranged outside of the projection lens and can be displaced between a first position and a second position via a drive. The change modifies the user access from an existing set of one or more users of the network system to a different set of one or more users of the network system. The method includes conducting a calibration of the device according to the calibration instructions corresponding to the at least two segments. Users can use the normal operation of their mobile assets to locate and alert, in real-time, areas where their assets are encountering rough operating environments, to provide for quicker emergency response, and to validate the effectiveness of repairs and rerouting. 3 eV greater than the LUMO of the acceptor material.