A substantially planar surface coexposes conductive or semiconductor features and a dielectric etch stop material. The MOFROM is completely compatible with the mainstream standard CMOS process. 0 g10 min and b) a copolymer of ethylene with about 10 to 30% by weight of C3\u2013C12\u2013\u03b1-olefin with a melt index MFI of about 0. The translated file is compiled to generate a corresponding translated object-code file.