The variable power supply to an amplifier in an electrical circuit is dynamically controlled through the use of a lookup table responsive to one or more operating conditions of the electrical circuit. The controlled CMP pad performance may be selected to optimize CMP pad dressing rate and dresser wear. The loop qualification systems and methods obtain LMU data on existing loops and also information on loops that have not yet been completed. A selected pixel location is mapped to a defect map if the characteristic for reflected light is substantially equal for the selected pixel location at each step of operating the device, and the characteristic for the reflected light at a step of operating the device substantially meets a predetermined standard. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits. The catalyst component layer contains a catalyst metal.