Provided is a sputtering apparatus which deposits a metal catalyst on an amorphous silicon layer at an extremely low concentration in order to crystallize amorphous silicon, and particularly minimizes non-uniformity of the metal catalyst caused by a pre-sputtering process without reducing process efficiency. The port guard is biased to the extended position over the flow ports, and may be moved to a retracted position where hydraulic fluid may flow between the flow ports and the probe. A unique backplane andor midplane arrangement for connecting the system components allows for easy and, in most cases, on-line field upgrading andor service and at the same time provides for the very effective cooling of components, particularly those such as disk drives which tend to produce a lot of heat. The present invention is significantly more environmentally friendly and economically excellent than conventional living radical polymerization methods, due to advantages such as low toxicity of the catalyst, low amount of the catalyst used, high solubility of the catalyst, mild reaction conditions, and no colorationno odor, and the like. The receiving portion is formed on the internal surface of the housing. Moreover, this invention proposes a design method for multi-project system-on-chip bench, it let the user can effectively manage available data and verification environment in each design process flow hierarchy and in turn an easy-to-use design process flow is thus derived.