An image device which includes reflowed color filters. The resilient material may be black to promote a seamless appearance. The memory cell further comprises a read access circuit including an input node connected to the storage element and an output node connected to a read bit line of the memory array. The light beams are reflected off of the first wavelength selective mirror and onto a first array of moveable micromirrors. The wafer is exposed to a reactive plasma to etch trenches into the substrate of the wafer with minimal redeposition of etch by-products to avoid pinching off the trench and to promote further etching. Included in such method are processes for handling sodium production in waste materials, reducing and handling production of H2S, removing sulfides from animal hides, safely disposing of sulfide waste, removing solids from the waste materials, and reducing water and reagent use and disposal.