The embodiments of mechanisms for forming sourcedrain regions of field effect transistors described enable forming an epitaxially grown silicon-containing layer with reduced number of particles on surface of recesses. The network device receives the UDID and a channel identifier from a content application executing at the mobile device, and accesses the database with the UDID and the channel ID to verify the user’s subscription to a content channel identified by the channel ID. The values and suits of the cards dealt are recorded in each round. When an input sequence is received, the write strategy matrix is used to determine in selected write strategy parameter that corresponds to the input sequence. An endpoint is detected by discounting the calculated polishing time while polishing the layer to be polished.