According to the present invention, a wet chemical oxidation and etch process cycle allows efficient removal of contaminated silicon surface layers prior to the epitaxial growth of raised source and drain regions, thereby effectively reducing the total thermal budget in manufacturing sophisticated field effect transistor elements. The information processing apparatus also generates machine-readable instructions based on the selected image processing services and generates a barcode corresponding to the machine-readable instructions, which is included on a document. The container has an enclosing wall which extends from the closed end to an open or capped end to define an interior region. In example implementations the centrifuge has a bowl angle of four degrees or less and a low fluid depth of two inches or less.