Aspects of the subject matter described herein relate to identity technology. Exclusive-OR between a calculation of the exclusive-OR at the time of the previous error correction data insertion and a calculation of the exclusive-OR at the time of the current error correction data insertion is calculated, thereby generating error correction data to be inserted at the present time. Additionally, the present invention eliminates the parasitic bipolar gain associated with CMOS device operation, reduces manufacturing costs, tightens control of device performance parameters, and provides for superior device characteristics as compared to the prior art. A plurality of stones positionable within the hole beneath the bottom of the housing and laterally spaced from the wall apertures is adapted to provide widely extended dispersion of water from the housing. The mask may also include or otherwise be operably connected to a PCM controller that can control the refractive index of an individual pixel area or a group of pixel areas aggregated into a superpixel.