An object is to provide a semiconductor device having a structure with which parasitic capacitance between wirings can be sufficiently reduced. Such compositions provide good cleaning performance together with excellent fabric care benefits. Openings are formed in the dielectric film. Accordingly, the surface traveling apparatus and the cleaning apparatus using the same can freely travel a plane, an inclined plane, a vertical plane, and a ceiling and thus, can clean areas which are not easily cleaned by people, such as windows or high buildings and high ceilings. The photoresist and the victim layer with slopes are used as the etching mask to etch the mask layer to form patterns.