A method of improving plasma processing of a semiconductor wafer by exposing the wafer or the plasma to photons while the wafer is being processed. A system for implementing the method is provided, including an administrative unit which controls a sequence of the functions in such a manner that it prevents a first function and a second function which interfere with one another from simultaneously running. The column level detector is coupled to a processor which analyzes, among other things, column height vs. In addition to the diagnostic applications of the disclosed method and apparatus, a therapeutic application is also contemplated wherein intraductal fluids are noninvasively aspirated using compression, heating and suction cycles to remove toxic buildups within the fluid. The computing device also obtains data representing the at least one physical layer signal. The disclosed handoff mechanism can be used in conventional wireless telecommunications systems.