Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. Ridges are provided forming chevron patterns between perforations in the trays to deflect liquid towards the casing sides and remove sediment therefrom. In use, a web traverses the drum with essentially no relative movement between the web and drum surface, and the print head are actuated to form images on the web, which may be identical or varied. The rules may specify allowed uses of the content, including whether or not the content can be copied or transferred, and whether and under what circumstances received content may be \u201cchecked out\u201d of one device and used in a second device. One embodiment is for the direct refrigerant cooling of an inverterconverter carrying higher power levels than most of the low power circuits previously taught, and does not require using a heat sink.