A method of manufacturing a semiconductor device is disclosed. The main picture processor produces corresponding main picture signals based on video signals from a memory. Additional isolated areas are formed remotely from the selected storage element by applying the isolation voltage to other remote storage elements. The tool exposes the standard substrate and simulated contamination defects to radiation having a wavelength of about 260 nanometers or less. The reaction inhibitor can be added to the polymerization mixture without the use of an organic solvent even at low temperatures, and problems such as the solidification of the reaction inhibitor inside the supply tank or piping, and subsequent blocking of the piping do not occur. One or more spatial light modulators are provided for generating the one or more reference beams by modulating a light beam with a modulation pattern having a spatial frequency higher than the spatial frequency of the data page.