An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table. A user can view at least one cycle, at least one control state, and at least one pressure. Each of the processors has a member queue, the combination of member queues combining to form the virtual queue. If the input IC security key and the stored IC security key do not match, access to protected functional circuitry is prohibited.