A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. The housing is configured to cool at least a portion of the cable. During the archiving operation, some of the data is replaced. The amount of lubricant dispensed is metered until the predetermined amount of lubricant is dispensed. The manifold has an inlet in flow communication with an outlet through a flow passage for forcing a fluid through the manifold. Within the memory cell structure, and at a minimum storage capacitor to bitline stud layer separation, a capacitor plate layer is further separated from the bitline stud layer than a capacitor node layer.