A developing apparatus is provided in which the concentration of a toner in a developer material and the amount of developer material is kept constant by the use of simple mechanical parts so as not to deteriorate the electrification performance of the developer material. A system for coordinating a plurality of RFID readers is also provided. The probe is configured to transition to a second set of physical parameters, the second set of physical parameters being different from the first set of physical parameters. The apparatus and method is suitable for fabricating patterned conductors, semiconductors and insulators on semiconductor wafers of a nano scale line width by direct nanoscale deposition of materials.