A method and apparatus in a data processing system for processing graphics data in a processing element. In another embodiment, the present invention includes a low-VOC andor low-toxicity coating formulation, including about 0. An inert gas is flowed into the transfer chamber and shut off in the process chamber. A pattern on a reticle is first generated using a medium such as computer software to interconnect a number of active areas on the wafer. And, a vacuum system is provided with only the quadrupole mass spectrometer which measures partial pressure strength according to a gas type in the vacuum system from an ion current intensity and does not have an ionization vacuum gauge other than the quadrupole mass spectrometer.