A multi-exposure drawing apparatus for drawing a given pattern on a workpiece is provided. In one embodiment, a first set of registers converts a double-data rate signal synchronized to a full-rate clock signal to two single-data rate signals. The short-circuit current is limited by the use of an additional test resistor which is arranged in the test circuit in series preferably with a semiconductor switch. The phosphor layer includes a phosphor material and MgO material. In one aspect, such layer is utilized as a cell dielectric layer in DRAM circuitry.