A system and method is provided which predicts problematic areas for lithography in a circuit design, and more specifically, which uses modeling data from a modeling tool to accurately predict problematic lithographic areas. Preferred compositions are co-melts of bromoxynil esters with at least one additional herbicide or pesticide, particularly atrazine. Buckling limiting flat surfaces of adjoining plates are brought into surface contact with each other when opposing segments of the chain are integrated together by driving sockets. Threads of other processes may not access the portion. The same approach can be using insider an organization over an internal network or Intranet.