An iPVD system is programmed to deposit uniform material, such as barrier material, into high aspect ratio nano-size features on semiconductor substrates using a process which enhances the sidewall coverage compared to the field and bottom coverage while minimizing or eliminating overhang within a vacuum chamber. A source application system that connects to external technologies, such as plug-ins, is ported from one computing environment or ecosystem to another and thereby integrated on the other ecosystem. A location processing unit includes a control system configured to receive uplink radio frequency signals communicated by client devices and determines the signal strengths of the uplink RF signals. When the user images a subject, image data obtained by such imaging is input to a dust correction circuit. The combination of the first and second plurality of FETs are usable as a replacement for a resistor.