A photomask includes a mask substrate to be irradiated with irradiation light, and first and second phase shifters arranged on the mask substrate. The insert is characterised by a WC-Co-based cemented carbide substrate having a highly W-alloyed Co-binder phase and a hard and wear resistant coating including a multilayered structure of sublayers of the composition N with a periodic and repeated variation of the TiAl ratio. In the event the bendable member is in a straight condition, the rigid member extends from the second end of the bendable member toward the support structure. Specific devices are provided as are methods for manufacturing and using such devices to treat disorders of the ear, nose or throat. Pressure is applied to the locking tab as it cools, thereby bringing the locking tab into its final position. In particular, there is provided a high-performance semiconductor device having excellent luminous efficiency, longevity and mass productivity; and a method for producing this semiconductor device.